Pengaruh Variasi Konsentrasi Zno Pada Karbon Aktif Terhadap Band Gap Setelah Impregnasi
DOI:
https://doi.org/10.59141/jist.v3i09.493Keywords:
karbon aktif; band gap; impregnasi; ZnOAbstract
ZnO semiconductors are good photocatalysts for degrading volatile organic pollutants into CO2 and H2O. Activated carbon has a high absorption capacity, and contains amorphous carbon. The purpose of this study was to determine the effect of variations in the concentration of ZnO on activated carbon on the band gap after impregnation. Determination of Bandgap value was determined using UV-DRS with the Tauc Plot method. The effect of variations in ZnO concentration on activated carbon on the band gap after impregnation shows the band gap value. The change in band gap value is caused by electron resonance when electrons from ZnO interact with polycyclic aromatic activated carbon. At the 20% variation there is a widening of the band gap value caused by a short wavelength shift. The conclusion obtained is that the characteristics of the AC-ZnO catalyst have band gap values for each variation, namely 2.69 eV, 2.7 eV, 2.97 eV, 4.85 eV and 3.0 eV. The band gap values increased with increasing concentrations of ZnO 5%, 10% and 15%.
Published
How to Cite
Issue
Section
License
Copyright (c) 2022 Dwi Cintya Rori, Mutiara Syabila
This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution-ShareAlike 4.0 International. that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work.